RE: Kodalith fine line developer formula (sort of)

From: Breukel, C. (HKG) ^lt;C.Breukel@lumc.nl>
Date: 11/23/04-10:06:10 AM Z
Message-id: <D291F33C586C8E48B95C26F8C805513A0451EFFB@mail5.lumc.nl>

Nick,

Do you have Tim's book? Got most of my stuff at home, so by hard I would say
that you do need the sulphite, but you have to tie it down (right
expression?..;-)..)

Best,

Cor

> -----Original Message-----
> From: Nick Zentena [mailto:zentena@sympatico.ca]
> Sent: Tuesday, November 23, 2004 4:53 PM
> To: alt-photo-process-l@sask.usask.ca
> Subject: Re: Kodalith fine line developer formula (sort of)
>
>
> On November 23, 2004 10:25 am, Breukel, C. (HKG) wrote:
> > Nick,
> >
> > The formaldehyde plays a crucial role: it binds the sodium
> sulfite. If the
> > sulphite is free, it will prevent the lith effect (See Tim
> Rudmens book for
> > a detailed description). It seems that the for,maldehyde
> can be replaced by
> > aceton, but I never tried that.
>
>
> Okay. So the developers that leave out both are no
> worse then those that
> contain them. The formaldehyde binds the sulfite. The sulfite
> doesn't provide
> anything to the Lith effect. OTOH the Lith formulas that
> contain just the
> sulfite should be avoided.
>
> For just lith printing is there a need for anything
> other then hydroquinone
> and sodium hydroxide?
>
> Nick
>
Received on Tue Nov 23 10:06:25 2004

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